图书情报工作 ›› 2021, Vol. 65 ›› Issue (16): 73-80.DOI: 10.13266/j.issn.0252-3116.2021.16.008

• 情报研究 • 上一篇    下一篇

“技术-功效”视角下的专利布局形势揭示与风险判定

王学昭1,2, 赵萍1, 赵亚娟1,2, 吕璐成1,2   

  1. 1 中国科学院文献情报中心 北京 100190;
    2 中国科学院大学经济与管理学院图书情报与档案管理系 北京 100190
  • 收稿日期:2020-04-20 修回日期:2021-05-13 出版日期:2021-08-20 发布日期:2021-08-20
  • 作者简介:王学昭(ORCID:0000-0001-8496-3354),研究员,博士,硕士生导师,E-mail:wangxz@mail.las.ac.cn;赵萍(ORCID:0000-0001-6599-9087),副研究员,硕士;赵亚娟(ORCID:0000-0003-3501-8131),研究员,博士,博士生导师;吕璐成(ORCID:0000-0002-2318-1037),助理研究员,博士研究生。
  • 基金资助:
    本文系国家自然科学基金委2019年度专项项目国家宏观战略中的关键问题研究项目"我国产业链战略安全研究"(项目编号:71950003)和中国科学院文献情报中心文献情报能力建设专项(一三五项目)"知识产权信息服务网络建设"(项目编号:院1844)研究成果之一。

The Identification of Patent Layout Situation and Risk Based on Technology-Effect Matrix

Wang Xuezhao1,2, Zhao Ping1, Zhao Yajuan1,2, Lü Lucheng1,2   

  1. 1 National Science Library, Chinese Academy of Sciences, Beijing 100190;
    2 Department of Library, Information and Archives Management, School of Economics and Management, University of Chinese Academy of Sciences, Beijing 100190
  • Received:2020-04-20 Revised:2021-05-13 Online:2021-08-20 Published:2021-08-20

摘要: [目的/意义] 掌握专利布局形势并判定当前面临的风险,对于有策略地进行专利布局和规避研发风险、抢占技术创新和产业升级竞争优势具有重要的意义。[方法/过程] 基于"技术-功效"矩阵,建立专利布局形势识别综合指标表达。通过综合判断与案例验证,形成普适的风险指标判断规则,以及当前专利布局风险的分析流程。基于"技术-功效"矩阵的专利布局形势图标可视化以及风险等级可视化的复合展现形式,直观展现专利布局形势与风险。[结果/结论] 落脚技术中观层面,形成基于"技术-功效"矩阵的专利布局形势的风险判定方法,有效揭示专利布局优势区、专利布局机会区、专利布局壁垒区和专利布局空白区,并进行应对策略探讨。该方法可从国家、区域、行业、机构、项目组、研发团队、个人等多个层面展开分析,支撑技术生命全周期的专利布局风险监测。

关键词: 专利布局, 专利风险, 技术-功效, 专利分析

Abstract: [Purpose/significance] Mastering the patent layout situation and judging the current risks are of great significance for strategically carrying out patent layout and avoiding R & D risks, and seizing the competitive advantage of technological innovation and industrial upgrading.[Method/process] Based on ‘technology-effect’ matrix, the comprehensive index expression of the identification of patent layout situation and risk was established. Through comprehensive judgment and multiple case verification, the model of patent layout situation and risk identification model was formed including the identification rule and analysis process. Based on the ‘technology-effect’ matrix, the patent layout situation icon visualization and risk level visualization were combined to directly show the patent layout situation and risk.[Result/conclusion] From the technological meso level, risk judging method of patent layout situation based on ‘technology-effect’ matrix was established, which can clearly detect the patent advantage zone, patent opportunity zone, patent barrier zone and patent blank zone. And the coping strategies were also discussed. The method can be carried out at multiple levels including countries, regions, industries, institutions, project teams, R & D teams, and individuals, which can support the monitoring of patent layout situation and risk throughout the whole technology life cycle.

Key words: patent layout, patent risk, technology-effect, patent analysis

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