[目的/意义] 掌握专利布局形势并判定当前面临的风险，对于有策略地进行专利布局和规避研发风险、抢占技术创新和产业升级竞争优势具有重要的意义。[方法/过程] 基于"技术-功效"矩阵，建立专利布局形势识别综合指标表达。通过综合判断与案例验证，形成普适的风险指标判断规则，以及当前专利布局风险的分析流程。基于"技术-功效"矩阵的专利布局形势图标可视化以及风险等级可视化的复合展现形式，直观展现专利布局形势与风险。[结果/结论] 落脚技术中观层面，形成基于"技术-功效"矩阵的专利布局形势的风险判定方法，有效揭示专利布局优势区、专利布局机会区、专利布局壁垒区和专利布局空白区，并进行应对策略探讨。该方法可从国家、区域、行业、机构、项目组、研发团队、个人等多个层面展开分析，支撑技术生命全周期的专利布局风险监测。
[Purpose/significance] Mastering the patent layout situation and judging the current risks are of great significance for strategically carrying out patent layout and avoiding R & D risks, and seizing the competitive advantage of technological innovation and industrial upgrading.[Method/process] Based on ‘technology-effect’ matrix, the comprehensive index expression of the identification of patent layout situation and risk was established. Through comprehensive judgment and multiple case verification, the model of patent layout situation and risk identification model was formed including the identification rule and analysis process. Based on the ‘technology-effect’ matrix, the patent layout situation icon visualization and risk level visualization were combined to directly show the patent layout situation and risk.[Result/conclusion] From the technological meso level, risk judging method of patent layout situation based on ‘technology-effect’ matrix was established, which can clearly detect the patent advantage zone, patent opportunity zone, patent barrier zone and patent blank zone. And the coping strategies were also discussed. The method can be carried out at multiple levels including countries, regions, industries, institutions, project teams, R & D teams, and individuals, which can support the monitoring of patent layout situation and risk throughout the whole technology life cycle.
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