[Purpose/significance] Mastering the patent layout situation and judging the current risks are of great significance for strategically carrying out patent layout and avoiding R & D risks, and seizing the competitive advantage of technological innovation and industrial upgrading.[Method/process] Based on ‘technology-effect’ matrix, the comprehensive index expression of the identification of patent layout situation and risk was established. Through comprehensive judgment and multiple case verification, the model of patent layout situation and risk identification model was formed including the identification rule and analysis process. Based on the ‘technology-effect’ matrix, the patent layout situation icon visualization and risk level visualization were combined to directly show the patent layout situation and risk.[Result/conclusion] From the technological meso level, risk judging method of patent layout situation based on ‘technology-effect’ matrix was established, which can clearly detect the patent advantage zone, patent opportunity zone, patent barrier zone and patent blank zone. And the coping strategies were also discussed. The method can be carried out at multiple levels including countries, regions, industries, institutions, project teams, R & D teams, and individuals, which can support the monitoring of patent layout situation and risk throughout the whole technology life cycle.
Wang Xuezhao
,
Zhao Ping
,
Zhao Yajuan
,
Lü Lucheng
. The Identification of Patent Layout Situation and Risk Based on Technology-Effect Matrix[J]. Library and Information Service, 2021
, 65(16)
: 73
-80
.
DOI: 10.13266/j.issn.0252-3116.2021.16.008
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